Contamination of ionization chamber due to tritium exposure
Fusion Technology, 8 (1985) 2461-2466
M. Matsuyamaa, K. Ichimuraa, K. Ashidaa, K. Watanabea, H. Satob
a Tritium Research Center, Toyama University, Gofuku 3190, Toyama 930, Japan
b Research and Development Laboratory, Aloka Co. Ltd., 1-22-6 Mure, Mitaka, Tokyo, Japan
Abstract
The contamination of three ionization chambers (Cu, Ni-plated,
and Au-plated chambers) due to exposure to HT or HTO was measured. Considerable
contamination took place for all of the chambera due to exposure to HTO.
This is caused by the physical adsorption of HTO. The extent of the contamination
differed from each other (Ni > Au > Cu), being considered due to
difference in their surface roughness. In case of the exposure to HT, the
Cu-chamber was contaminated in room air, whereas the Ni-chamber did in
dry air atmosphere. This is considered due to the adsorption of HTO (being
formed with catalytic exchange reaction between HT and H2O) on the Cu-chamber and that of HT on the Ni-chamber.
The Au-chamber was not contaminated with the exposure to HT.
This is because neither the adsorption of HT nor the catalytic exchange reaction takes place on this surface.